Calibrated in-vacuum quantum efficiency system for metallic and III-V thin-film photocathodes

Journal article

Rasheed, A., Benjamin, C., Elhoussieny, I., Ramachers, Y. and Bell, G. 2023. Calibrated in-vacuum quantum efficiency system for metallic and III-V thin-film photocathodes. Journal of Vacuum Science & Technology B. 41 (6). https://doi.org/10.1116/6.0002904
AuthorsRasheed, A., Benjamin, C., Elhoussieny, I., Ramachers, Y. and Bell, G.
AbstractThe construction and calibration of a high vacuum system for thin film growth and in situ quantum efficiency (QE) measurement are described. Surface cleaning by in situ argon ion sputtering and annealing is supported. The QE measurement is based on an external 265 nm LED and in situ positively biased collector grid. The system is applied to two metallic and two semiconducting photocathodes: polycrystalline silver and copper, and single crystal InP and InSb. Surface cleaning protocols are shown to have a dramatic effect on the QE for all of these materials. The maximum QE values achieved for clean InSb and InP are around 8 × 10−5, for Cu 9 × 10−5 and for Ag 2 × 10−4.
KeywordsMaterials Chemistry; Electrical and Electronic Engineering; Surfaces, Coatings and Films; Process Chemistry and Technology; Instrumentation; Electronic, Optical and Magnetic Materials
Year2023
JournalJournal of Vacuum Science & Technology B
Journal citation41 (6)
PublisherAmerican Vacuum Society
ISSN2166-2746
2166-2754
Digital Object Identifier (DOI)https://doi.org/10.1116/6.0002904
Official URLhttps://pubs.aip.org/avs/jvb/article/41/6/064006/2926365/Calibrated-in-vacuum-quantum-efficiency-system-for
FunderScience and Technology Facilities Council
Publication dates
Online05 Dec 2023
Print01 Dec 2023
Publication process dates
Accepted08 Nov 2023
Deposited14 Dec 2023
Accepted author manuscript
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Open
Output statusPublished
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